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Sigma-Aldrich 257222 Trimethylaluminum 97% CAS No.: 75-24-1 100 gr
Category
Brand
Stock Code
LB.SA.257222-100G
Kısa Bilgi
Linear Formula: (CH3)3Al CAS Number: 75-24-1 Molecular Weight: 72.09 Beilstein: 3587197 EC Number: 200-853-0 MDL number: MFCD00008252 UNSPSC Code: 12352103 PubChem Substance ID: 24855575 NACRES: NA.23
| Sigma-Aldrich 257222 Trimethylaluminum 97% CAS No.: 75-24-1 100 gr |
| Linear Formula: (CH3)3Al CAS Number: 75-24-1 Molecular Weight: 72.09 Beilstein: 3587197 EC Number: 200-853-0 MDL number: MFCD00008252 UNSPSC Code: 12352103 PubChem Substance ID: 24855575 NACRES: NA.23 |
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PROPERTIES
vapor pressure 69.3 mmHg ( 60 °C)
Quality Level 200 description heat of vaporization: ~41.9 kJ/mol (dimer) Assay 97% form liquid reaction suitability core: aluminum bp 125-126 °C (lit.) 127 °C/760 mmHg 20 °C/8 mmHg 56 °C/50 mmHg mp 15 °C (lit.) density 0.752 g/mL at 25 °C (lit.) SMILES string C[Al](C)C InChI 1S/3CH3.Al/h3*1H3; InChI key JLTRXTDYQLMHGR-UHFFFAOYSA-N DESCRIPTION General description Trimethylaluminum (TMA) is a widely used precursor in the chemical vapor deposition (CVD) process to produce thin films in various applications. TMA is highly reactive and pyrophoric, which makes it an effective source of aluminum in thin film deposition processes to improve optoelectronic properties, such as enhanced light absorption and carrier transport characteristics. Application Trimethylaluminum can be used: - As a growth initiator to synthesize self-assembled aluminum nanoparticles via atomic layer deposition. - As a precursor to synthesize aluminum-doped ZnO thin films(AZO) for electron transport layer of perovskite solar cells. TMA enhances electrical conductivity and thermal stability of perovskite layers. - To fabricate Al2O3-coated Si-alloy anodes for Li-ion batteries. This coating helps to suppress the volume expansion of Si and improves cell stability. -To fabricate Al2O3-coated graphite electrode with superior anti-self-discharging behavior (260 h) with long stability (900 cycles), for Al-ion battery. |
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